A Mini Review on the Status of Thin Film Deposition Techniques for High-Performance Solar Cells: Successes, Challenges, and Future Prospects

Abstract

Thin film deposition holds promise for the photovoltaic community in the production of high-quality thin film solar cells. This has sparked various scientific efforts aimed at obtaining good thin films to improve the performance of these devices. In this review, the various deposition techniques, such as atomic layer deposition (ALD), chemical vapor deposition (CVD), spray pyrolysis, spin coating, physical vapor deposition (PVD), and chemical bath deposition (CBD), have been critically reviewed, and their advantages and disadvantages have been determined. The various optoelectronic properties, including direct band gap, refractive index, high absorption coefficient, tunable band gap, and transparent conductive films, have also been considered, as they aid in the improvement of device performance. The performance of the devices has been evaluated using various photovoltaic parameters, such as open circuit voltage (Voc), short circuit current density (Jsc), fill factor (FF), and power conversion efficiency (PCE). Various techniques, along with their corresponding performance in relation to solar cells, have been elucidated. The challenges and future prospects of various deposition techniques have been reviewed. This review will provide more insights into the most effective techniques for the future production of high-quality thin films using inexpensive methods, benefiting both scientists and industrial applications.